发明名称 PHOTO FABRICATION DEVICE AND WIPER DEVICE
摘要 PROBLEM TO BE SOLVED: To provide a photo fabrication device which secures the smoothness of the level of a resin liquid during lowering of a table, even when the viscosity of the resin liquid is high. SOLUTION: In the photo fabrication device equipped with a liquid vessel 1 filled with a photocurable resin liquid 2, a light emitting means 5 which emits a light to the resin liquid 2, the table 3 which laminates the resin liquid 2 cured by the emission of the light and a means to made even the level 6 smoothly, a small chamber space 12 demarcated by a partition member 10 is provided on one of the side parts of the liquid vessel 1 and a rocking member 11 urged by a spring to the partition member 10 side is arranged in the small chamber space 12. Thus the device structurally works so that the resin liquid 2 trapped in the small chamber space 12 is pushed out of the upper end of the partition member 10 into the liquid vessel 1 by the movement of the rocking member 11 in which a spring force is accumulated when the member 11 returns to the partition member 10 side. As described, a surface tension generated between the level 6 and a work (w) is made to disappear by forcing the significant change of the height of the level 6 of the resin liquid 2 when the table 3 is lowered and the flow of the resin liquid 2 onto the work (w) is facilitated.
申请公布号 JP2001198984(A) 申请公布日期 2001.07.24
申请号 JP20000008724 申请日期 2000.01.18
申请人 AZUMA KOKI:KK 发明人 NAKAZAWA YOSHIHITO
分类号 B29C67/00;(IPC1-7):B29C67/00 主分类号 B29C67/00
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