发明名称 Mechanism for performing water repellency processing on both sides simultaneously
摘要 A substrate holder (22) on which a plurality of optical lens base materials (24) are arranged is installed to be rotatable in a vacuum atmosphere and a vacuum processing chamber (16) for forming water repellent films on the surfaces of the optical lens base materials, and further a both sides simultaneous water repellency processing mechanism is installed in this vacuum processing chamber. In regard to the substrate holder (22), an upper side water repellency processing unit (30) and a lower side water repellency processing unit (40) are provided, and the upper side water repellency processing unit forms the water repellent film on the upper side of the optical lens base material, while the lower side water repellency processing unit forms the water repellent film on the lower side of the optical lens base material. This configuration forms the water repellent films simultaneously onto the both sides of the optical lens base material. A film thickness correcting mechanism for the water repellency processing is composed of a film thickness correcting plate (51, 52) for correcting a film thickness difference, which is arranged between the water repellency processing unit and the optical lens base material.
申请公布号 US6264751(B1) 申请公布日期 2001.07.24
申请号 US19990214676 申请日期 1999.04.01
申请人 HOYA CORPORATION 发明人 KAMURA HITOSHI;YOSHIHARA MASAAKI;KAMIYA HAJIME
分类号 C23C14/04;C23C16/04;C23C16/458;(IPC1-7):C23C14/00 主分类号 C23C14/04
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