Photoresist polymers of carboxyl-containing alicyclic compounds

摘要

The present invention relates to a carboxyl-containing alicyclic compound represented by Chemical Formula 1:wherein, R1 and R2, which may be identical to or different from each other, represent hydrogen or a tert-butyl group; X represents hydrogen, hydroxy or oxygen; and n represents a number from 1 to 3. Compounds of the present invention are useful as monomers in a photoresist resin, and in a process for preparing the same.