发明名称 VERY SMALL GROOVE ETCHING METHOD, AND MANUFACTURING METHOD OF FLUID DYNAMIC PRESSURE BEARING
摘要 PROBLEM TO BE SOLVED: To efficiently form a very small groove with high accuracy by the electrolytic etching. SOLUTION: A resist layer 2 is formed on a surface 1A of a work 1 with the very small groove to be formed thereon, the patterning corresponding to the required very small groove is performed, an electrolyte 5 is interposed between the work 1 and a machining electrode 3, the pulse voltage is applied from a pulse voltage generator 6, and the work 1 is electrolytically etched using this resist layer 2.
申请公布号 JP2001200400(A) 申请公布日期 2001.07.24
申请号 JP20000009184 申请日期 2000.01.18
申请人 SEIKO INSTRUMENTS INC 发明人 IWAKI TADAO;OGUCHI KAZUAKI
分类号 B23H9/00;C25F3/14;F16C17/02;F16C33/10;F16C33/14;(IPC1-7):C25F3/14 主分类号 B23H9/00
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