发明名称 |
Method and apparatus for controlling byproduct induced defect density |
摘要 |
A method and apparatus for reducing byproduct induced defects in a processing tool is provided. A purge gas is introduced into a vessel of the processing tool. The vessel is heated to a temperature above a vaporization temperature of the byproduct. The temperature is maintained for a predetermined period of time. The vessel is purged to remove at least a portion of the byproduct.
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申请公布号 |
US6263590(B1) |
申请公布日期 |
2001.07.24 |
申请号 |
US19990351982 |
申请日期 |
1999.07.12 |
申请人 |
ADVANCED MICRO DEVICES, INC. |
发明人 |
WHIGHAM WILLIAM A.;CULP MARK E.;NELSON ALLAN T. |
分类号 |
C23C16/44;(IPC1-7):F26B7/00 |
主分类号 |
C23C16/44 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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