发明名称 Method and apparatus for controlling byproduct induced defect density
摘要 A method and apparatus for reducing byproduct induced defects in a processing tool is provided. A purge gas is introduced into a vessel of the processing tool. The vessel is heated to a temperature above a vaporization temperature of the byproduct. The temperature is maintained for a predetermined period of time. The vessel is purged to remove at least a portion of the byproduct.
申请公布号 US6263590(B1) 申请公布日期 2001.07.24
申请号 US19990351982 申请日期 1999.07.12
申请人 ADVANCED MICRO DEVICES, INC. 发明人 WHIGHAM WILLIAM A.;CULP MARK E.;NELSON ALLAN T.
分类号 C23C16/44;(IPC1-7):F26B7/00 主分类号 C23C16/44
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