发明名称 Method for producing a microstructured surface relief by embossing thixotropic layers
摘要 A method is described for producing a microstructured surface relief by applying to a substrate a coating composition which is thixotropic or which acquires thixotropic properties by pretreatment on the substrate, embossing the surface relief into the applied thixotropic coating composition with an embossing device, and curing the coating composition following removal of the embossing device. The substrates obtainable by this method, provided with a microstructured surface relief, are particularly suitable for optical, electronic, micromechanical and/or dirt repellency applications.
申请公布号 AU4050601(A) 申请公布日期 2001.07.24
申请号 AU20010040506 申请日期 2001.01.12
申请人 INSTITUT FUR NEUE MATERIALIEN GEM. GMBH 发明人 ANDREAS GIER;NORA KUNZE;MARTIN MENNIG;PETER W. OLIVEIRA;STEFAN SEPEUR;BRUNO SCHAFER;HELMUT SCHMIDT
分类号 B05D5/06;B05D1/42;B05D3/12;B05D7/24 主分类号 B05D5/06
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