发明名称 |
APPARATUS FOR SUPPLYING CVD COATING DEVICES |
摘要 |
An apparatus supplies CVD coating devices with coating gas and includes an intermediate reservoir for accommoda- tion of the gaseous coating material arranged between a storage tank and a coating device. The volume of the reservoir is set to a predetermined, maximum pressure change in the intermediate reservoir upon withdrawal of the mass of gas required for a coating step. The intermediate reservoir can be connected to a gas recovery station.
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申请公布号 |
CA2106734(C) |
申请公布日期 |
2001.07.24 |
申请号 |
CA19932106734 |
申请日期 |
1993.09.22 |
申请人 |
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发明人 |
BITTNER, HANS J.;KLEIN, HANS-JUERGEN;KUEPPER, THOMAS;MOERSEN, EWALD |
分类号 |
C23C16/448;(IPC1-7):C23C16/00 |
主分类号 |
C23C16/448 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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