发明名称 VAPOR DEPOSITION SYSTEM
摘要 PROBLEM TO BE SOLVED: To provide a vapor deposition system capable of preventing reduction in reflux efficiency while preventing high temperature corrosion in the vicinity of the upper part of a crucible. SOLUTION: The vapor deposition system has: a crucible 12 for holding a sample metal 100; an electron gun 13 for heating the sample metal 100 in the crucible 12 to generate metal vapor 100a; a vapor sealing device 15 for connecting a vapor deposition substrate 101 provided above the crucible 12 and the crucible 12; and a cooling block 14 for connecting the crucible 12 and the vapor sealing device. In this system, the internal wall surface of the cooling block 14 is inclined at an angle of 50-70 deg. with respect to a horizontal direction.
申请公布号 JP2001200355(A) 申请公布日期 2001.07.24
申请号 JP20000011351 申请日期 2000.01.20
申请人 MITSUBISHI HEAVY IND LTD 发明人 TOKUNAGA KAZUTOSHI;MIYOSHI SHINICHI
分类号 C23C14/24;H01L21/203;(IPC1-7):C23C14/24 主分类号 C23C14/24
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