发明名称 METHOD FOR TREATING RESIN CONTAINING HALOGEN BASED SUBSTANCE
摘要 <p>PROBLEM TO BE SOLVED: To provide a method for treating resins containing a halogen based substance which avoids generation of halogen based organic compounds (such as dioxins) particularly due to the lowering of the reaction effect of a treating agent for want of its amount added since it is difficult to previously know the amount of a halogen based substance in the resin while it is easy to know the amount of the resin in a substance to be treated and thus it is difficult to determine the amount of the treating agent for effectively carrying out reaction in subjecting the substance to be treated to heat treatment by the addition of the treating agent. SOLUTION: This method for treating resins containing a halogen based substance comprises introducing a substance to be treated having the resins containing a halogen based substance and a treating agent composed of an alkali substance into a decomposition reaction furnace 1 to heat them, and allowing a decomposed gas generated to react with the treating agent to render the gas harmless. In this instance, the amount of the treating agent added is set at the weight equal to or more than the weight of the resins to be treated.</p>
申请公布号 JP2001200094(A) 申请公布日期 2001.07.24
申请号 JP20000011205 申请日期 2000.01.20
申请人 MEIDENSHA CORP 发明人 KASHIWAGI YOSHIYUKI;YOSHIOKA NOBUYUKI
分类号 C08J11/16;C10L5/46;(IPC1-7):C08J11/16 主分类号 C08J11/16
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