LITHOGRAPHIC METHOD USING HYPERFINE PROBE

摘要

PROBLEM TO BE SOLVED: To develop lithographic technology allowing a hyperfine grooved pattern having a width of few nm to few hundred nm to be drawn on a sample such as a resist film, a mask formation film and a highly functional film. SOLUTION: The base end of the nano-tube 12 is fixed to a holder 8 and its end is protruded from the holder 8 to form a nano-tube probe 12. The end of the probe is arranged in contact with a sample surface and voltage E is applied between the probe and a sample to cause the probe to be moved while removing sample materials from a probe contact portion to form a grooved pattern on the sample surface. An AFM probe or an STM probe can be used as the hyperfine probe. If the sample is an organic film 4, voltage E is applied between the probe and the organic film with the probe 12 being a cathode. By using the most effective nano-tube, the width W of the groove 16 to be formed is controlled to be few nm to few hundred nm because the diameter of the nano-tube is distributed from about 1 nm to few ten nm.