CVD APPARATUS FOR MANUFACTURING SEMICONDUCTOR

摘要

PURPOSE: A CVD(Chemical Vapor Deposition) apparatus for manufacturing a semiconductor is provided to be capable of shortening work period and enhancing remarkably productivity by mounting a plurality of process chambers on both sides of a transfer chamber and stacking three load racks within a load rack chamber. CONSTITUTION: A moving unit(21) for loading/unloading a wafer is equipped in a transfer chamber(20). At least three process chambers(31,32,33) are respectively mounted on both sides and a rear side of the transfer chamber(20). The wafer loaded/unloaded in the process chambers(31,32,33) is stored in at least three load racks(41), which are stacked in a load rack chamber(40). In this structure, the wafers(W) within the process chambers(31,32,33) are unloaded toward the load racks(41) within the chamber(40) or loaded inversely.