发明名称 METHOD OF MANUFACTURING SHADOW MASK BY GALVANOPLASTY AND MASTER SHADOW MASK THEREOF
摘要 PURPOSE: A method of manufacturing a shadow mask by galvanoplasty and a master shadow mask thereof are provided to produce a master to mass produce shadow mask having intricate and complex penetrating holes by galvanoplasty. CONSTITUTION: In the method of manufacturing a shadow mask by galvanoplasty, an etching shadow mask is placed on a conductive element. A plastic element is applied on the etching shadow mask. The plastic element is cleaned up. The etching shadow mask is eliminated. The sides and the bottom part of the conductive element are insulated by an insulation element. Here, silicon is used as the plastic element.
申请公布号 KR20010069162(A) 申请公布日期 2001.07.23
申请号 KR20000002744 申请日期 2000.01.12
申请人 KIM, JUNG SIK 发明人 KIM, JUNG SIK
分类号 H01J9/02;(IPC1-7):H01J9/02 主分类号 H01J9/02
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