发明名称 METHOD OF FORMING MICRO STRUCTURE HAVING NANO-SCALE SURFACE ROUGHNESS
摘要 PURPOSE: A method of forming a micro structure having a nano-scale surface roughness is provided to produce a micro structure having a nano-scale surface roughness. CONSTITUTION: In the method of forming a micro structure having a nano-scale surface roughness, a micro structure of a certain size and shape is formed on the substrate. A carbon polymer layer of a certain depth is coated on the substrate having the micro structure. The carbon polymer layer is etched using a reaction gas including a mixture of an O2 gas capable of etching the carbon polymer layer and a gas capable of etching the micro structure, and a mask layer is formed by the remnants of the carbon polymer layer. Lastly, both the masked and unmasked part of the micro structure is eliminated using the mixed reaction gas, thus making the surface having a nano-scale roughness.
申请公布号 KR20010068443(A) 申请公布日期 2001.07.23
申请号 KR20000000363 申请日期 2000.01.05
申请人 SAMSUNG SDI CO., LTD. 发明人 CHA, SEUNG NAM;CHOI, JUN HUI;LEE, HANG U
分类号 B81C1/00;C23F4/00;H01J9/02;H01L29/66;(IPC1-7):B81C1/00 主分类号 B81C1/00
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