| 摘要 |
PURPOSE: A method of focusing an electron beam using a shadow mask is provided to obviate a scattering of the electron beam passing through the shadow mask holes, achieve a desired focusing spot by adjusting an applied voltage, a thickness of a dielectric layer and a length between a mask and a panel. CONSTITUTION: A mask small hole is faced for an electron gun which discharge the electron beam, while a mask large hole is faced for a screen(4) in the shadow mask(1). First, a dielectric layer(2) and a metallic layer(3) are formed on the shadow mask(1) to be formed a complete screen by reaching the electron beam to the screen(4) by focusing the electron beam passed through a hole of the shadow mask(1). Then, a low potential(V1) is applied to the screen(4) and the metallic layer(3), while a high potential(V2) which is relatively higher than the low potential(V1) is applied to the shadow mask(1).
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