发明名称 |
Abbe arm calibration system for use in lithographic apparatus |
摘要 |
In a lithographic apparatus, a reference grating 11 mounted on the wafer table WT is illuminated with a measurement beam 20 incident in a direction independent of wafer table tilt. The diffraction orders are detected by detector 30 and used to determine the lateral shift in the wafer table resulting from a non-zero Abbe arm, and hence the Abbe arm, for calibration purposes. The detector 30 may be a detector also used for off-axis alignment of the wafer and wafer table.
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申请公布号 |
US2001008273(A1) |
申请公布日期 |
2001.07.19 |
申请号 |
US20010758172 |
申请日期 |
2001.01.12 |
申请人 |
GROENEVELD ROGIER H.M.;LOOPSTRA ERIK R.;BURGHOOM JACOBUS;LEVASIER LEON M.;STRAAIJER ALEXANDER |
发明人 |
GROENEVELD ROGIER H.M.;LOOPSTRA ERIK R.;BURGHOOM JACOBUS;LEVASIER LEON M.;STRAAIJER ALEXANDER |
分类号 |
G01B11/00;G01B15/00;G03F7/20;G03F7/213;G03F9/00;H01L21/027;(IPC1-7):G21K7/00;G01N23/00;G21K5/10;H01J37/08 |
主分类号 |
G01B11/00 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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