PHENOL/ALICYCLIC COPOLYMER AND PHOTORESIST

摘要

PROBLEM TO BE SOLVED: To provide a new polymer useful as a component of chemically amplified positive-acting resists. SOLUTION: A photoresist composition containing a photoactive component and a resin binder containing a polymer containing 1) a photoacid-labile ester group containing a tertiary ester alicyclic group having at least about 125 Å3 molecular volume and present in an amount of about 1-50 mol% based on all the polymer units and 2) repeating units of a phenol group present in an amount of about 20-95 mol% based on all the polymer units is provided.