| 摘要 |
PROBLEM TO BE SOLVED: To eliminate a beam-induced distortion of a lens which is exposed to a rectangular optimal beam. SOLUTION: This optical device is specially an optical device in a microlithography projection exposure system and has a slit-shaped image field or a rotation asymmetrical illumination. An optical member 101 is exposed to the radiation of a light source rotation asymmetrically. The member 101 has absorption films 104 and 105. The absorption of the films is distributed so that the absorption is rotation asymmetrical at least about complementarily to the luminance distribution of an exposure due to the radiation of the light source. An additional heating of the member 101 is caused for an energy absorbed in the films 104 and 105 and a better rotation asymmetrical temperature distribution and finally, a compensation for an image error in a light induction are brought. |
