| 摘要 |
<p>Disclosed is a heating system or microwave processing system for a material or an object, comprising an applicator or oven (5) which is fed by two separate magnetrons (11, 12). The magnetrons are mounted on the combined branches (3, 4) of a magic T-coupler or directional coupler, forming a ring. The other combined branches (1, 2) irradiate the material (10). Impedance adapters (8,9) are disposed in the branches (3,4) and/or in front of the magnetrons (11, 12) for decoupling the operation of the magnetrons and transmission of the full amount of power emitted by the magnetrons to the material or object. According to the method described, it is possible to obtain a constant, homogeneous, maximum distribution on the object or material, or inversely, a distribution which is modulated according to the material or object, i.e. a maximum amount of central distribution and less distribution on the surface, by adjusting the impedance adapters with the aid of dual balanced mixers, for example.</p> |
