| 摘要 |
PROBLEM TO BE SOLVED: To provide an external appearance inspection device and its inspection method capable of inspecting defects such as irregular color and flaws, occurring on a semiconductor wafer, a liquid crystal panel, or the like, at high speed and with high accuracy, and capable of easily coping with the enlargement of an inspected work while maintaining inspection accuracy and inspection throughput. SOLUTION: A plurality of photographing/processing units 1 are disposed for photographing an inspected work W and processing inspection images. By using the plurality of units 1, the whole surface or a part of the work W is dividedly photographed and each of the units 1 independently inspects and processes a taken picture. Based on results of the inspection and processing, an integrated judgement part 3 judges whether the work W is good or bad.
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