| 摘要 |
PROBLEM TO BE SOLVED: To provide the lamp unit of a light irradiation-type thermal treatment equipment which is capable of efficiently and easily cooling down a lamp without making a lamp cooling structure complicated and large and quickly raising the temperature of a semiconductor wafer at a higher speed than usual. SOLUTION: The lamp unit of a light irradiation-type thermal treatment equipment has such a light source in which filament lamps 4 in which annular light emitting tubes 7 are different from each other in diameter are arranged in groups making their light emitting tubes 7 concentrically disposed on the same plane, the lamp groups are arranged in a stepped manner making their centers coincident with each other, and a mirror 5 is provided at the back of the filament lamps 4, where the side wall 51 of the mirror 5 is made to protrude between the filament lamps 4 up to the filament lamps 4 of the other lamp group. A venting hole 14 is bored in the mirror 5. |
