SEMICONDUCTOR PROCESSING CHAMBER AND CONTROL METHOD THEREOF

摘要

PROBLEM TO BE SOLVED: To enable an accurater measurement of a pressure and an accurater control of the pressure in a semiconductor processing process. SOLUTION: A semiconductor processing chamber is provided with a first chamber 53 which is provided with a gas introducing vent 71 and is arranged with a wafer 58, a second chamber 54 connected with a gas exhaust means 62, a baffle member 52 to demarcate the chamber 53 and the chamber 54 at least one aperture for gas circulation provided in the member 52 and a control means to control the aperture area of the aperture for gas circulation.