METHOD FOR PRODUCING ARTICLE COATED WITH PATTERNED FILM AND PHOTOSENSITIVE COMPOSITION

摘要

A method for producing an article coated with a patterned film which comprises applying a photosensitive composition comprising an organic metal or silicon compound having photosensitivity and a metal or silicon alkoxide having hydrolizability on a substrate, exposing the substrate to the radiation with a light to effect the polymerization of the exposed portion of the applied coating film, and then removing through dissolving the unexposed portion of the film, wherein the organic metal or silicon compound is a metal or silicon oxide containing an allyl group; and the above-described photosensitive composition. The article coated with a patterned film produced by the method has a pattern from which an unexposed film has been completely removed by the development after radiation with a light, and thus is excellent in the accuracy of patterning.