PHOTOSENSITIVE COMPOSITION FOR ULTRAVIOLET LASER LIGHT, PHOTOSENSITIVE IMAGE FORMING MATERIAL AND NEGATIVE IMAGE FORMING METHOD USING SAME

摘要

PROBLEM TO BE SOLVED: To provide a photosensitive composition for ultraviolet laser light having high sensitivity to ultraviolet laser light and excellent in safelight properties under a yellow lamp, a photosensitive image forming material and a negative image forming method using the material. SOLUTION: The photosensitive composition for ultraviolet laser light comprises a photosensitive composition having the maximum peak of its spectral sensitivity in the wavelength region of 350-385 nm and contains (A) an ethylenical unsaturated compound, (B) a biimidazole derivative and (C) an α- aminoacetophenone derivative. The photosensitive image forming material for ultraviolet laser light is obtained by forming a layer of the photosensitive composition on the surface of a base. In the negative image forming method, the photosensitive image forming material is imagewise exposed with ultraviolet laser light of 400 nm wavelength and developed with an alkaline developing solution.