| 摘要 |
PROBLEM TO BE SOLVED: To provide a tack-free dry film photoresist having a reduced cold flow and an improved dry film structure. SOLUTION: The dry film photoresist has a glass transition temperature above room temperature, contains a crosslinking agent having a weight average molecular weight of at least about 500D, has an improved cold flow and has been disposed by coating on a polyethylene terephthalate support. |
