发明名称 OPTICAL WAVE GUIDE CIRCUIT DEVICE AND ITS MANUFACTURING METHOD
摘要 <p>PROBLEM TO BE SOLVED: To enhance productivity of an optical wave guide circuit device by forming an electrode pattern by making the wet etching from an electrode layer laminated by sputters on the thin film heater pattern of a heating device of the optical wave guide circuit device which can tune an optical path length finely. SOLUTION: In the optical wave guide circuit device containing an optical waveguide 10 which has a core layer 1 and a clad layer 2 which covers the core layer 1, and the heating device 20 disposed on the clad layer 2 of the optical waveguide 10, this device is formed from a thin film heater pattern 3 with which the heating device 20 consists of a tantalum nitride layer, a tantalum silicide layer, or a tungsten silicide layer formed on the clad layer 2, and an electrode pattern 4 formed by the wet etching method from an electrode layer which consists of a golden layer or platinum layer laminated by the sputters on it.</p>
申请公布号 JP2001194633(A) 申请公布日期 2001.07.19
申请号 JP20000005406 申请日期 2000.01.14
申请人 SUMITOMO ELECTRIC IND LTD 发明人 HIROSE TOMOKANE;KOYAMA KENJI
分类号 G02B6/12;G02B6/13;G02F1/01;(IPC1-7):G02F1/01 主分类号 G02B6/12
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