| 摘要 |
PROBLEM TO BE SOLVED: To provide a substrate treater of a structure that a reduction in a metal contamination, foreign matters and the like, which are generated from the space covered with a work coil cover provided in the treater, is made possible. SOLUTION: Semiconductor wafers 16 are mounted on a susceptor 15. Work coils 20 are provided under the lower side of the susceptor 15. A work coil cover 21 made of a quartz is placed on a base 13 in such a way as to cover the coils 20. A sealing part 27 is provided on the lower part of the inner peripheral part of the cover 21. A growth treating space 11 for performing an epitaxial growth on the wafers 16 and a work coil installation space 12 installed with the coils 20 are sealed with the cover 21 and the sealing part 27. The sealing part 27 is provided with a bellows 34 having flanges 33 and 35 on both ends of the bellows 34. O-rings 31 and 37 are respectively provided on the end surfaces of the flanges 33 and 35.
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