发明名称 SEMICONDUCTOR INTEGRATED CIRCUIT AND TEST METHOD THEREFOR
摘要 PROBLEM TO BE SOLVED: To realize a semiconductor integrated circuit which can improve detection rate for defects. SOLUTION: A PMOS 111 of high threshold voltage is provided between a VDD line 101 and a VDDV line 103, and an NMOS 121 of high threshold voltage is provided between a VSS line 102 and a VSSV line 104. A logic gate circuit 105, which receives supply of each power-supply voltage from the VDDV line 103 and the VSSV line 104 comprises PMOSs 131 to 133 and NMOSs 141 to 143 with a low threshold voltage. A voltage output from a voltage generation circuit 201 which generates a desired voltage in accordance with the test signal input from a pad 205 is applied to a sub-straight terminal of the PMOSs 131 to 133.
申请公布号 JP2001196545(A) 申请公布日期 2001.07.19
申请号 JP20000355795 申请日期 2000.11.22
申请人 OKI ELECTRIC IND CO LTD 发明人 YOKOMIZO KOICHI
分类号 H01L21/822;G01R31/26;H01L21/66;H01L21/82;H01L21/8238;H01L27/04;H01L27/092;H03K19/00;H03K19/094;(IPC1-7):H01L27/04;H01L21/823 主分类号 H01L21/822
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