发明名称 |
TUNNEL MAGNETORESISTIVE EFFECT ELEMENT, THIN MAGNETIC FILM HEAD, MEMORY ELEMENT, AND MANUFACTURING METHOD FOR THEM |
摘要 |
PROBLEM TO BE SOLVED: To prevent formation of extra current paths which do not contribute to tunnel magnetoresistive effect. SOLUTION: A TMR element 3 has a free layer 11 formed on a lower gap layer 2, a tunnel barrier layer 12 formed on this free layer 11, and a pinned layer 13 formed on this tunnel barrier layer 12. The pinned layer 13 and the tunnel barrier layer 12 have a side wall 14 formed by etching. The TMR element 3 comprises a redeposited layer 15 of an oxidized substance redeposited on the side wall 14 by further etching. |
申请公布号 |
JP2001196659(A) |
申请公布日期 |
2001.07.19 |
申请号 |
JP20000003265 |
申请日期 |
2000.01.12 |
申请人 |
TDK CORP |
发明人 |
SHIMAZAWA KOJI;ARAKI SATORU |
分类号 |
G11B5/39;G11C11/15;H01F10/08;H01F10/32;H01L21/8246;H01L27/105;H01L43/08;(IPC1-7):H01L43/08 |
主分类号 |
G11B5/39 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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