发明名称 |
POINT-OF-USE EXHAUST BY-PRODUCT REACTOR |
摘要 |
A method and an apparatus is provided for removing wafer processing by-products from gas fluid exhaust systems utilizing an energy source placed within an exhaust channel either alone or in combination with a cleaning gas. The placement of the energy source in an exhaust channel enables emitted energy to react with wafer processing by-products to convert the by-product residues to more removable forms. Additionally provided is a cleaning gas source internal to the exhaust channel to further react with and convert exiting by-product residues to gaseous fluids.
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申请公布号 |
US2001008618(A1) |
申请公布日期 |
2001.07.19 |
申请号 |
US19980167269 |
申请日期 |
1998.10.07 |
申请人 |
COMITA PAUL B.;RANGANATHAN REKHA;CARLSON DAVID K.;DUBOIS DALE R.;FORSTNER HALI J.L. |
发明人 |
COMITA PAUL B.;RANGANATHAN REKHA;CARLSON DAVID K.;DUBOIS DALE R.;FORSTNER HALI J.L. |
分类号 |
B01J19/00;C23C16/44;C23C16/455;H01L21/205;(IPC1-7):B01D47/00;B32B27/02 |
主分类号 |
B01J19/00 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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