POSITIVE TYPE PHOTORESIST COMPOSITION

摘要

PROBLEM TO BE SOLVED: To provide a positive type photoresist composition which ensures improved edge roughness of a resist pattern in the production of a semiconductor device and is excellent in preservability at room temperature and in line density dependency. SOLUTION: The positive type photoresist composition contains (A) an acid generating compound represented by a specified structure, (B) an acid decomposable resin containing at least specified silicon-containing repeating units or repeating units with a specified structure and having solubility to an alkali developing solution increased by the action of the acid and (C) a specified solvent.