发明名称 |
SUBSTRATE DIPPING EQUIPMENT |
摘要 |
PROBLEM TO BE SOLVED: To provide a substrate dipping equipment which can highly efficiently dip substrates and can highly efficiently utilize a liquid chemical. SOLUTION: The substrate dipping equipment is provided with a plurality of cleaning tanks W1 and W2 arranged adjacently to one liquid chemical tank CH. The substrate treating efficiency and liquid chemical utilizing efficiency of the equipment are improved by shortening the waiting time for the treatment with the liquid chemical by performing time-consuming cleaning treatment in parallel by using the cleaning tanks W1 and W2. In addition, since a substrate immediately moves to the immediately adjacent cleaning tank W1 or W2 when the treatment of the substrate with the liquid chemical ends and the next cleaning treatment is started, the staying time of the substrate in the air becomes the shortest and the contamination of the substrate can be prevented.
|
申请公布号 |
JP2001196342(A) |
申请公布日期 |
2001.07.19 |
申请号 |
JP20000004337 |
申请日期 |
2000.01.13 |
申请人 |
DAINIPPON SCREEN MFG CO LTD |
发明人 |
IMAI MASAYOSHI;TSURUMAKI SATOSHI |
分类号 |
B08B3/04;H01L21/304;H01L21/306;(IPC1-7):H01L21/304 |
主分类号 |
B08B3/04 |
代理机构 |
|
代理人 |
|
主权项 |
|
地址 |
|