发明名称 |
Lithographic apparatus with system for determining the Abbe arm |
摘要 |
<p>In a lithographic apparatus, a reference grating 11 mounted on the wafer table WT is illuminated with a measurement beam 20 incident in a direction independent of wafer table tilt. The diffraction orders are detected by detector 30 and used to determine the lateral shift in the wafer table resulting from a non-zero Abbe arm, and hence the Abbe arm, for calibration purposes. The detector 30 may be a detector also used for off-axis alignment of the wafer and wafer table. <IMAGE></p> |
申请公布号 |
EP1117010(A2) |
申请公布日期 |
2001.07.18 |
申请号 |
EP20010300255 |
申请日期 |
2001.01.12 |
申请人 |
ASML NETHERLANDS B.V. |
发明人 |
GROENEVELD, ROGIER HERMAN MATHIJS;LOOPSTRA, ERIK ROELOF;BURGHOORN, JACOBUS;LEVASIER, LEON MARTIN;STRAAIJER, ALEXANDER |
分类号 |
G03F9/00;(IPC1-7):G03F9/00 |
主分类号 |
G03F9/00 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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