| 发明名称 |
Measuring apparatus and method for measuring structures on a substrat |
| 摘要 |
<p>The device has a non-optical measurement device (23) mounted on a bearer element (15), whereby normal air pressure conditions exist between the measurement device and the substrate (9). The measurement device can be an atomic force microscope (24) or an electron beam objective. An optical lens can be used to rapidly locate structure on the substrate. Independent claims are also included for the following: a method of measuring structures on a substrate.</p> |
| 申请公布号 |
EP1116932(A2) |
申请公布日期 |
2001.07.18 |
| 申请号 |
EP20000126646 |
申请日期 |
2000.12.05 |
| 申请人 |
LEICA MICROSYSTEMS WETZLAR GMBH |
发明人 |
RINN, KLAUS |
| 分类号 |
G01B11/00;G01B7/34;G01B11/02;G01B15/00;G01B21/00;G01B21/02;G01B21/20;G01B21/30;G01Q30/02;G01Q60/24;G12B5/00;H01J37/22;H01J37/28;H01J37/301;H05K3/00;(IPC1-7):G01B7/34 |
主分类号 |
G01B11/00 |
| 代理机构 |
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