Blank for halftone phase shift photomask and halftone phase shift photomask

摘要

A blank for a halftone phase shift photomask comprises a transparent substrate (110) and a halftone phase shift film provided thereon, and said halftone phases shift film has a multilayer construction in which at least a first layer (121) capable of being etched with a chlorinated gas and a second layer (122) capable of being etched with a fluorinated gas are disposed in this order from the side near said transparent substrate. A film made of tantalum silicides is suitable to use as the second layer of the halftone phase shift film. When such a blank is first etched with a fluorinated gas and then etched with chlorinated gas, because an etching selective ratio to a transparent substrate made of synthetic quartz and the like can be taken sufficiently while maintaining the applicability to the exposure light with a short wavelength that is characteristic of silicide materials in addition to good chemical stability and good processing properties that are characteristic of tantalum materials, patterning in high precision will be made possible. As a result, it is possible to obtain an ideal halftone phase shift photomask excellent in stability after mask processing and in the applicability to the short wavelength.