发明名称 SOURCE FOR MOLECULAR BEAM AND MOLECULAR BEAM EPITAXY DEVICE
摘要 PROBLEM TO BE SOLVED: To sufficiently secure a filling amount of a molecular beam material even when a crucible is allowed to incline and to obtain stable strength of the molecular beam even when the amount of the molecular beam material is reduced. SOLUTION: In a molecular beam source cell 101, a crucible 102 having an inlet opening part 111 and a heater 103 which is attached to the crucible 102 and heats a molecular beam material filled in the crucible 102 to generate the molecular beam by evaporation and sublimation from the inlet opening part 111 are provided. The crucible 102 mentioned above is bent between a part 108 to be filled with the molecular beam material and the inlet opening part 111 so that the molecular beam material filled in the part 108 can be seen from the inlet opening part 11, and each sectional area in the horizontal direction of the part 108 to be filled with the molecular beam material is made nearly uniform.
申请公布号 JP2001192293(A) 申请公布日期 2001.07.17
申请号 JP20000101104 申请日期 2000.04.03
申请人 SHARP CORP 发明人 NAKABAYASHI KEIYA;TANI KENTARO;KAWASAKI TAKASHI;MAKINO OSAYUKI;SUGA YASUO;TANI YOSHIHEI
分类号 C30B23/08;H01L21/203;(IPC1-7):C30B23/08 主分类号 C30B23/08
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