| 摘要 |
PROBLEM TO BE SOLVED: To provide a method and a system for depositing an AlOx film in which film characteristics are controlled in such a manner that, in a vacuum film deposition chamber, the film characteristics (the permeability of water vapor, the permeability of oxygen and the transmissivity of all rays) of the AlOx film are simultaneously controlled at the time of film deposition. SOLUTION: In a vacuum film deposition chamber, the ray transmissivity of an AlOx film deposited on a transparent substrate composed of dielectric substance is measured respectively at two wavelengths of one wavelength selected from the range of 250 to 400 nm and one wavelength selected from the range of 500 to 600 nm, while monitoring is executed, the amount of reaction gas to be introduced is controlled so that the ray transmissivity reaches 77 to 80%, in this stage, the amount of oxygen to be introduced is fixed, and, so as to retain the same ray transmissivity, the deposition of the AlOx film is executed, and, in the case the same ray transmissivity is changed in the process of the film deposition, the amount of Al to be evaporated is controlled on occation by monitoring at the above specified two wavelengths to retain the same ray transmissivity, and the deposition of the AlOx film is continued.
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