发明名称 |
Pattern forming material and pattern forming method |
摘要 |
The pattern forming material of the present invention includes a polymer having a group which generates an acid when the polymer is irradiated with an energy beam or heated and a compound which generates a base when the compound is irradiated with an energy beam. The polymer is a binary polymer or a polymer of a higher degree obtained by polymerizing another group with a compound represented by the following general formula:where R1 indicates a hydrogen atom or an alkyl group, and R2 and R3 independently indicate a hydrogen atom, an alkyl group, a phenyl group or an alkenyl group, or together indicate a cyclic alkyl group, a cyclic alkenyl group, a cyclic alkyl group having a phenyl group or a cyclic alkenyl group having a phenyl group.
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申请公布号 |
US6261736(B1) |
申请公布日期 |
2001.07.17 |
申请号 |
US19990416049 |
申请日期 |
1999.10.12 |
申请人 |
MATSUSHITA ELECTRIC INDUSTRIAL CO., LTD. |
发明人 |
ENDO MASAYUKI;SHIRAI MASAMITSU;TSUNOOKA MASAHIRO |
分类号 |
G03F7/004;G03F7/039;G03F7/20;G03F7/26;G03F7/38;(IPC1-7):G03C1/73;C08J3/28 |
主分类号 |
G03F7/004 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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