发明名称 |
Variable transmission reticle for charged particle beam lithography tool |
摘要 |
A compound reticle having generally complementary clear and opaque areas on a portion of subfield in each of two reticle layers which can be moved relative to each other form a variable transmissivity shutter to regulate charged particle beam intensity independently of source beam current. Either homogeneous or inhomogeneous (e.g. having local variations in beam current density) can be produced at will and in rapid succession to study effects of beam current on beam pattern resolution and aberrations as well as optimum focus for particular patterned subfields having respectively differing transmissivities.
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申请公布号 |
US6262427(B1) |
申请公布日期 |
2001.07.17 |
申请号 |
US19990353793 |
申请日期 |
1999.07.15 |
申请人 |
NIKON CORPORATION |
发明人 |
GORDON MICHAEL S. |
分类号 |
H01J37/304;(IPC1-7):H01J37/304 |
主分类号 |
H01J37/304 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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