| 摘要 |
PROBLEM TO BE SOLVED: To provide a method for removing hydrogen chloride, etc., from a reducing gas at a low running cost, having high reaction rate of hydrogen chloride, etc., in the reducing gas and capable of removing the hydrogen chloride, etc., to an extremely low level with a simple and inexpensive apparatus. SOLUTION: The removal of hydrogen chloride, etc., is carried out by (a) pouring an aqueous solution of sodium hydroxide into an HCl-containing reducing gas of >=1.1 MPa at 700-1500 deg.C to form NaCl by the contact reaction with HCl, (b) cooling the reaction product gas containing NaCl to <=800 deg.C to solidify the NaCl and then to 400-600 deg.C or below to reduce the concentration of hydrogen chloride, etc., to about 1 ppm and (c) separating and removing the solidified Nail with a filter or a cyclone, etc.
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