发明名称 |
Antireflective coating compositions comprising photoacid generators |
摘要 |
The invention provides new light absorbing crosslinking compositions suitable for use as an antireflective composition, particularly for deep UV applications. The antireflective compositions of the invention comprise a photoacid generator that is activated during exposure of an overcoated photoresist. Antireflective compositions of the invention can significantly reduce undesired footing of an overcoated resist relief image.
|
申请公布号 |
US6261743(B1) |
申请公布日期 |
2001.07.17 |
申请号 |
US19980058343 |
申请日期 |
1998.04.10 |
申请人 |
SHIPLEY COMPANY, L.L.C. |
发明人 |
PAVELCHEK EDWARD K.;DOCANTO MANUEL |
分类号 |
G03F7/004;C08J9/26;C09D5/00;G03F7/09;G03F7/095;G03F7/11;H01B3/46;H01L21/027;H01L21/316;(IPC1-7):G03F7/30;G03C1/825 |
主分类号 |
G03F7/004 |
代理机构 |
|
代理人 |
|
主权项 |
|
地址 |
|