| 摘要 |
PROBLEM TO BE SOLVED: To deposit a carbonaceous hard film capable of high hardness, high adhesion properties for a base material, wide base material selectivity, structural stability, room temperature deposition and the increase of the area which have been difficult heretofore. SOLUTION: In this method for vapor-depositing a carbonaceous hard film on a base material under the evacuated pressure, in the case an evaporation carbonaceous material is ionized or is not ionized and is deposited on the surface of a substrate, gas cluster ions generated by ionizing a gas cluster as an aggregate of the atoms or molecules of a substance gaseous at ordinary temperature and under ordinary pressure are cast to deposit a film. |
