发明名称 |
METHOD FOR MANUFACTURING HIGH PURITY SILICA GLASS WITH ADDITIVE DOPED |
摘要 |
PROBLEM TO BE SOLVED: To provide a method for manufacturing high purity silica glass low in shrinkage percentage when dried and low in the possibility to generate cracks owing to pores while doping an additive uniformly. SOLUTION: This method for manufacturing silica glass with the additive doped comprises a powder preparation step 100 to prepare silica powder with the additive doped by dispersing 110 silica particles in a dispersion medium, adding 120 an additive-containing gas to the silica-dispersed medium, drying 130, heating 140 and pulverizing 150 it and a silica glass manufacturing step 200 to manufacture silica glass with the additive doped by using as a starting material the silica powder prepared at the powder preparation step.
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申请公布号 |
JP2001192212(A) |
申请公布日期 |
2001.07.17 |
申请号 |
JP20000370619 |
申请日期 |
2000.12.05 |
申请人 |
SAMSUNG ELECTRONICS CO LTD |
发明人 |
BOKU KONTOKU;KIN TOSHUN;TEI GENNICHI;RI KOBIN |
分类号 |
C01B33/12;C03B8/02;C03B19/10;C03B19/12;C03B20/00;C03C3/06;(IPC1-7):C03B8/02 |
主分类号 |
C01B33/12 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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