发明名称 |
LIQUID SPRINKLING APPARATUS |
摘要 |
PROBLEM TO BE SOLVED: To uniformly sprinkle a resist liquid or an etching liquid over a material to be processed without lowering productivity. SOLUTION: Roller conveyors 213 for passing a pallet 1 loading a work W through a liquid jet region while rotating the same are provided and the angle of the surface of the work W to liquid jet nozzles 6 is changed.
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申请公布号 |
JP2001190997(A) |
申请公布日期 |
2001.07.17 |
申请号 |
JP20000005143 |
申请日期 |
2000.01.14 |
申请人 |
SEIKO EPSON CORP |
发明人 |
OGAWA HIDEYUKI;NAKAMURA TAKASHI;SHINPO TOSHINAO;FURUHATA ATSUSHI |
分类号 |
B05D1/02;B05B13/02;(IPC1-7):B05B13/02 |
主分类号 |
B05D1/02 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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