发明名称 LIQUID SPRINKLING APPARATUS
摘要 PROBLEM TO BE SOLVED: To uniformly sprinkle a resist liquid or an etching liquid over a material to be processed without lowering productivity. SOLUTION: Roller conveyors 213 for passing a pallet 1 loading a work W through a liquid jet region while rotating the same are provided and the angle of the surface of the work W to liquid jet nozzles 6 is changed.
申请公布号 JP2001190997(A) 申请公布日期 2001.07.17
申请号 JP20000005143 申请日期 2000.01.14
申请人 SEIKO EPSON CORP 发明人 OGAWA HIDEYUKI;NAKAMURA TAKASHI;SHINPO TOSHINAO;FURUHATA ATSUSHI
分类号 B05D1/02;B05B13/02;(IPC1-7):B05B13/02 主分类号 B05D1/02
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