发明名称 SPUTTERING TARGET FOR DEPOSITING OPTICAL RECORDING PROTECTIVE FILM CAPABLE OF DIRECT CURRENT SPUTTERING
摘要 PROBLEM TO BE SOLVED: To provide a sputtering target for depositing an optical recording protective film consisting of a zinc chalcogenide-silicon dioxide-baron oxide system sintered body capable of d.c. sputtering. SOLUTION: This target has a composition containing silicon dioxide of 10 to 30 mol%, boron oxide of 0.5 to 30 mol%, and the balance zinc chalcogenide.
申请公布号 JP2001192819(A) 申请公布日期 2001.07.17
申请号 JP20000000802 申请日期 2000.01.06
申请人 MITSUBISHI MATERIALS CORP 发明人 KYO JINKO;ODA JUNICHI
分类号 G11B7/26;C04B35/547;C23C14/34 主分类号 G11B7/26
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