发明名称 Protection structure for high-voltage integrated electronic devices
摘要 A protective structure having a plurality of protection regions extending along closed lines arranged inside each other. Each intermediate protective region is tangent to two different adjacent protective regions, at different areas, so as to form a connection in series with the adjacent protective regions. The protective structure can be of resistive material, such as to form a series of resistors, or it can include doped portions alternately of P- and N-type, such as to form a plurality of anti-series arranged diodes. The structure can be made of polycrystalline silicon extending on the substrate surface, or can be integrated (implanted or diffused) inside the substrate.
申请公布号 US6262454(B1) 申请公布日期 2001.07.17
申请号 US19990256530 申请日期 1999.02.24
申请人 发明人
分类号 H01L29/06;H01L29/10;H01L29/40;H01L29/78;(IPC1-7):H01L29/72 主分类号 H01L29/06
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