| 摘要 |
PROBLEM TO BE SOLVED: To obtain a polymer for preventing irregular reflection, usable when forming superfine pattern of 64M, 356M, 1G, 4G, 16G DRAM, and capable of increasing the yield of the product, and further to provide a method for producing the polymer. SOLUTION: This organic reflection-preventing compound contains a chromophore having high absorbance so that the compound itself used as a reflection-preventing film may absorb the light having 193 nm and 248 nm wave lengths, and has a mechanism of causing a cross-linking reaction between an alcohol group and a functional group at the hard-baking time after the coating to impart formability, airtightness and solubility to the organic reflection-preventing film, introduced thereinto. As a result, the efficiency of the cross-linking reaction and preservation stability are improved, and the reflection-preventing resin has excellent solubility in the whole hydrocarbon- based solvent, and also resistance to dissolution of not being dissolved in any solvent after the bard baking. |
