发明名称
摘要 <p>PURPOSE:To provide a FET capable of reducing parasitic capacitance between a gate and a drain while having a single gate FET characteristic. CONSTITUTION:In a field-effect transistor, an active layer is provided in a surface side of a semiconductor substrate 1, and a gate electrode 5 and a gate electrode 5 are interposed between a source electrode 6 and a drain electrode 7. which are respectively provided on the active layer. A shield wire 9 is provided between the gate electrode 5 and the drain electrode 7.</p>
申请公布号 JP3188346(B2) 申请公布日期 2001.07.16
申请号 JP19930139656 申请日期 1993.06.10
申请人 发明人
分类号 H01L29/812;H01L21/338;H01L29/80;(IPC1-7):H01L21/338 主分类号 H01L29/812
代理机构 代理人
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