发明名称 PROCESS CHAMBER ASSEMBLY WITH REFLECTIVE HOT PLATE
摘要 A hot plate assembly includes a base plate, a lid and a housing positioned between the base plate and the lid. The housing, lid and base plate form a process chamber. An insulator is positioned adjacent to the base plate in the process chamber. An air gap is formed at least partially between a bottom surface of the insulator and a top surface of the base plate. A hot plate is positioned adjacent to the insulator in the process chamber. At least a first reflective member is positioned between the hot plate and the insulator.
申请公布号 WO0077833(A3) 申请公布日期 2001.07.12
申请号 WO2000US16635 申请日期 2000.06.16
申请人 SILICON VALLEY GROUP, INC.;LEE, JAE, YUN;CHASE, LOVELL, C. 发明人 LEE, JAE, YUN;CHASE, LOVELL, C.
分类号 H01L21/027;H01L21/00;(IPC1-7):H01L21/00 主分类号 H01L21/027
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