PROCESS CHAMBER ASSEMBLY WITH REFLECTIVE HOT PLATE
摘要
A hot plate assembly includes a base plate, a lid and a housing positioned between the base plate and the lid. The housing, lid and base plate form a process chamber. An insulator is positioned adjacent to the base plate in the process chamber. An air gap is formed at least partially between a bottom surface of the insulator and a top surface of the base plate. A hot plate is positioned adjacent to the insulator in the process chamber. At least a first reflective member is positioned between the hot plate and the insulator.
申请公布号
WO0077833(A3)
申请公布日期
2001.07.12
申请号
WO2000US16635
申请日期
2000.06.16
申请人
SILICON VALLEY GROUP, INC.;LEE, JAE, YUN;CHASE, LOVELL, C.