发明名称 Thermal treatment apparatus for various types of substrate has a pressure tight transparent cover
摘要 The infra-red heating unit(1) is covered by one or more radiation-transparent plates(6,7), at least one of which forms a pressure tight seal with the equipment to prevent explosion risk. An Independent claim is made for a process for thermal treatment of substrates in which the a substrate passes the heater and heat is provided both directly through radiation from the emittors(2) and also indirectly through reflection of the radiation at reflectors(3).
申请公布号 DE10035080(A1) 申请公布日期 2001.07.12
申请号 DE20001035080 申请日期 2000.08.07
申请人 HITSCHFEL, WERNER 发明人
分类号 B29C35/08;H01L21/00;(IPC1-7):F26B3/02;B05D3/02 主分类号 B29C35/08
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