| 摘要 |
<p>A method and apparatus for conditioning a polishing pad is described. The method includes steps of moving a cylindrical roller (202) having an abrasive substance affixed to it against a moving polishing pad (46). The roller may be actively rotated or reciprocated at variable rates, while maintaining a pressure against the polishing pad. The apparatus includes a cylindrical roller attached to one or more pressure application devices mechanically connected to the roller.</p> |
